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dc.contributor.authorMulcahy, Thomas L.en_US
dc.date.accessioned2015-09-02T14:02:03Z
dc.date.available2015-09-02T14:02:03Z
dc.date.issued2005
dc.identifier.urihttp://commons.lib.niu.edu/handle/10843/13877
dc.format.extentxiii, 164 pagesen_US
dc.publisherNorthern Illinois Universityen_US
dc.rightsNIU theses are protected by copyright. They may be viewed from Huskie Commons for any purpose, but reproduction or distribution in any format is prohibited without the written permission of the authors.en_US
dc.subject.lcshLithography, Electron beam--Industrial applicationsen_US
dc.titleProcess optimization for fabrication of nano scale resist patterns using electron beam lithographyen_US
dc.type.genreDissertation/Thesisen_US
dc.typeTexten_US
dc.contributor.departmentDepartment of Electrical Engineeringen_US
dc.description.degreeM.S. (Master of Science)en_US


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